Please use this identifier to cite or link to this item: http://hdl.handle.net/11400/10623
Title: Realization and simulation of high aspect ratio micro/nano structures by proton beam writing
Authors: Χατζηχρηστίδη, Μαργαρίτα
Βαλαμόντες, Ευάγγελος Σ.
Ράπτης, Ιωάννης Α.
Van Kan, Jeroen Anton
Watt, Frank R.
Item type: Conference publication
Conference Item Type: Poster
Keywords: Electroplating;Fluid mechanics;Optimization;Photoresistors;Pressure drop;Structural optimization;Φωτοαντιστάσεις;Ηλεκτρολυτική;Μηχανική ρευστών;Βελτιστοποίηση;Πτώση πίεσης;Διαρθρωτική βελτιστοποίηση
Subjects: Technology
Electrical engineering
Τεχνολογία
Ηλεκτρολογία Μηχανολογία
Issue Date: 17-May-2015
2007
Publisher: IEEE
Abstract: In this paper, proton beam writing is combined with an aqueous developable-easily stripped negative chemically amplified resist (TADEP: thick aqueous developable epoxy resist) for the realization of high aspect ratio structures. Monte Carlo method is used to simulate PBW in thick resist films. Result shows that resist structures with 280 nm linewidth and aspect ratio of 40 were easily resolved.
Language: English
Citation: Chatzichristidi, M., Valamontes, E.S., Raptis, I.A., Van Kan, J.-A. & Watt, F.R. (2007) Realization and simulation of high aspect ratio micro/nano structures by proton beam writing, In: Proceedings of the 20th International Microprocesses and Nanotechnology Conference, MNC 2007. Kyoto, Japan. 5-8 November, 2007. [online]. p. 420-421, 4456283. Available from: http://ieeexplore.ieee.org/
Conference: 20th International Microprocesses and Nanotechnology Conference, MNC 2007
Access scheme: Embargo
License: Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες
URI: http://hdl.handle.net/11400/10623
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