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Title: Surface roughness induced by plasma etching of si-containing polymers
Authors: Τσερέπη, Αγγελική Δ.
Γογγολίδης, Ευάγγελος
Κωνσταντούδης, Βασίλειος
Κορδογιάννης, Γεώργιος
Ράπτης, Ιωάννης Α.
Contributors: Βαλαμόντες, Ευάγγελος Σ.
Item type: Journal article
Keywords: Bilayer resists;Plasma treatment;Silicon-containing polymers;Surface roughness;Επιφανειακή τραχύτητα;Ανθεκτική Διστοιβάδα;Επεξεργασία πλάσματος;Πολυμερή που περιέχουν πυρίτιο
Subjects: Technology
Chemical technology
Χημική τεχνολογία
Issue Date: 18-May-2015
Publisher: Taylor & Francis
Abstract: Interfacial properties of polymers and their control become important at submicrometer scales, as polymers find widespread applications in industries ranging from micro- and nano-electronics to optoelectronics and others fields. In this work, we address the issue of controlled modification of surface topography of Si-containing polymers when subjected to oxygen-based plasma treatments. Treated surfaces were examined by atomic force microscopy to obtain surface topography and roughness of plasma-treated surfaces. Our experimental results indicate that an appropriate optimization of plasma chemistry and processing conditions allows, on one hand, small values of surface roughness, a result crucial for the potential use of these polymers for sub-100 nm lithography, and, on the other hand, desirable topography, applicable for example in sensor devices. Plasma processing conditions can be modified to result either in smooth surfaces (rms roughness < 1 nm) or in periodic structures of controlled roughness size and periodicity.
Language: English
Citation: TSEREPI, A.D., GOGOLIDES, E., CONSTANTOUDIS, V., CORDOYIANNIS, G., RAPTIS, I.A., et al. (2003). Surface roughness induced by plasma etching of si-containing polymers. Journal of Adhesion Science and Technology. [online] 17 (8). p. 1083-1091. Available from:[Accessed 02/04/2012]
Journal: Journal of Adhesion Science and Technology
Type of Journal: With a review process (peer review)
Access scheme: Embargo
License: Αναφορά Δημιουργού-Μη Εμπορική Χρήση-Όχι Παράγωγα Έργα 3.0 Ηνωμένες Πολιτείες
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