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Issue DateTitleAuthor(s)
2015-05-17; 2008-03-24Electron-beam-patterning simulation and metrology of complex layouts on Si/Mo multilayer substratesΠάτσης, Γεώργιος; Δρυγιαννάκης, Δ.; Τσικρικάς, Ν.; Ράπτης, Ιωάννης; Γογγολίδης, Ευάγγελος
2015-05-18; 2007-01-27Stochastic simulation studies of molecular resistsΔρυγιαννάκης, Δ.; Πάτσης, Γεώργιος; Ράπτης, Ιωάννης; Βιδάλη, Β.; Νιακουλά, Δ.
2015-05-18; 2006-04Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughnessΠάτσης, Γεώργιος; Γογγολίδης, Ευάγγελος
2015-05-17; 2008Electron beam lithography simulation for the patterning of extreme ultraviolet masksΤσικρικάς, Ν.; Πάτσης, Γεώργιος; Ράπτης, Ιωάννης; Quesnel, E.; Gerardino, Annamaria
2015-05-17; 2007-12-10Pattern matching, simulation, and metrology of complex layouts fabricated by electron beam lithographyΤσικρικάς, Ν.; Δρυγιαννάκης, Δ.; Πάτσης, Γεώργιος; Ράπτης, Ιωάννης; Gerardino, Annamaria
2015-05-17; 2008-05Processing effects on the dissolution properties of thin chemically amplified photoresist filmsΔρυγιαννάκης, Δ.; Ράπτης, Ιωάννης; Πάτσης, Γεώργιος; Μπουντούβης, Α.; vanWerden, K.
2015-05-17; 2008-05Stochastic simulation studies of molecular resists for the 32 nm technology nodeΔρυγιαννάκης, Δ.; Πάτσης, Γεώργιος; Τσικρικάς, Ν.; Κόκκορης, Γ.; Μπουντούβης, Ανδρέας
2015-05-18; 2007-09-20Stochastic simulation of material and process effects on the patterning of complex layoutsΤσικρικάς, Ν.; Δρυγιαννάκης, Δ.; Πάτσης, Γεώργιος; Ράπτης, Ιωάννης; Σταυρουλάκης, Σ.
2015-05-17; 2007-02-25Stochastic simulation of material and process effects on the patterning of complex layoutsΤσικρικάς, Ν.; Δρυγιαννάκης, Δ.; Πάτσης, Γεώργιος; Κόκκορης, Γεώργιος; Ράπτης, Ιωάννης
2015-05-18; 2006-04Electron-beam lithography simulation for the fabrication of EUV masksΠάτσης, Γεώργιος; Τσικρικάς, Ν.; Ράπτης, Ιωάννης; Γλέζος, Ν.